Contact information

Postal address:
P.O. Box 3500
FI-02015 TKK, FINLAND

Tel: +358-9-451 6068 (Director)
Fax: +358-9-451 3164
(More detailed contact information)

Visiting address:
Tietotie 3 (Otaniemi)
02150 Espoo
FINLAND
(Map)

 

 

  
UMK | Uusien materiaalien keskus | Center for New Materials

Microscopy

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Ambient AFM/STM (Nanoscope III)

  • Morfology of sample surface, adhesion force measurements
  • Measurements at ambient pressure in controlled gas composition and humidity
  • Maximum sample size 5 mm x 5 mm
  • Maximum scanning range 100 μm (lateral), 6.8 μm (vertical)
  • Resolution in STM mode 0.5 (lateral), 0.1 (vertical)
  • Resolution in AFM mode 1 (vertical) and laterally depending on the probe diameter

Contact person: Jouko Lahtinen / Fysiikan laboratorio


More information: http://www.fyslab.hut.fi/surface/facilities.html



UHV STM (RHK750VT)

  • Morfology of sample surface
  • Measurements in ultra high vacuum
  • Sample diameter about 10 mm
  • Maximum scanning range 8 μm (lateral), 1 μm (vertical)
  • Resolution 0.5 (lateral), 0.05 (vertical)

Contact person: Jouko Lahtinen / Fysiikan laboratorio


More information: http://www.fyslab.hut.fi/surface/facilities.html

WITec alpha 300 combined Raman microscope and atomic force microscope

  • Possibility to perform Raman spectroscopy or Raman scatter mapping and AFM imaging either simultaneously or sequentally
  • Details about Raman:
    • Excitation laser: Frequency doubled Nd:YAG green (λ=532.25 nm, 30 mW)
    • Objectives: Olympus 100X (NA=0.95) and 20X (NA=0.4) air objectives and 10X and 60X liquid objectives
    • Detector: Electron multiplying EMCCD camera (Andor Newton DU970-BV)
  • Details about AFM:
    • All basic imaging modes are available (contact, AC, phase detection, lateral force mode...)
    • Fluid cell available for measurements in liquid
    • Pulsed force mode available
  • The instrument is equipped with active vibration insulation system (TS-150)

Contact person: Monica Österberg / Puunjalostuksen kemian laboratorio

Laser scanning Microscope (Nikon TE2000-U)

  • Modular system built around Nikon TE2000-U inverted microscope.
  • Sample scanned with three-axis nanopositioner.
  • A variety of CW or pulsed laser sources available for laser scanning applications.
  • Wide field transmitted and reflected light microscopy as well as epifluorescence.
  • Different detectors can be used depending on applications:
    • Diodes
    • APDs
    • PMTs
    • Photon counting modules
Contact person Klas Lindfors / Optiikka ja molekyylimateriaalit



Metallurgy_SEM

LEO 1450 SEM

  • Thermal W-cathode, especially suitable for microanalysis.
  • EDS (Energydispersive) and WDS (Wavedispersive) analysator.
  • Samplepreparation and light-optical microscopy.
  • Surface morphology (SE-image) and phase structure of surface from cross-section (BSE-image).
  • Point- and line-analyses qualitatively/quantitatively
      • Element maps
  • Elements B-U
      • Smallest volume V >= 10-12 cm3
      • Mass >= 10-15 g.
  • Smaller tasks done as service. Longer use demands training and passing of an exam.

Contact person Erkki Heikinheimo / Metallurgian laboratorio.

More information: metallurgy.hut.fi/sem.php


FESEM

JEOL JSM-6335F Field Emission SEM

  • Magnification: 10x - 500000x.
  • Optimal resolution: 1.5 nm.
  • Illumination current: 0.0001 - 2 nA.
  • LINK x-ray microanalyzer (EDS).

Contact person doc. Kari Lounatmaa / Elektroniikan valmistustekniikan laboratorio.

More information: www.ept.hut.fi/Facilities


TEM

Tecnai 2G Bio Twin TEM

Especially for soft-matter analysis.

  • Two CCD-cameras:
      • 1392*1040 px for diffraction- and low magnification work.
      • Microscopic camera 2048*2048 px for higher resolution work.
  • Sampleholders: Multiple specimen holder (4 samples), Double tilt, Single tilt, Cryo-transfer multiple (3 samples). Tomography software.

Contact person Janne Ruokolainen / Optiikka ja molekyylimateriaalit.

More information: omm.hut.fi



AFM

NTegra Scanning Probe Microscope (SPM)

Morphology of surfaces by contact / semicontact AFM and STM

  • Lateral Force Microscopy (LFM)
  • Force Modulation Microscopy (FMM)
  • Electrical SPM imaging (SKM, SRI, SCM, EFM)
  • Magnefic Force Microscopy (MFM)
  • Oxidation & scratching lithography

  • max. sample size ca. 10 mm x 20 mm
  • max. scanning area 14 µm
  • res. 3 Å vertical
  • diameter of probe tip ca. 10-100 nm

  • Scanning head configuration for AFM, LFM, FMM and MFM:
    • max. sample size 4" wafer
    • max. scanning area 100 µm
    • res. 1 nm vertical

Contact person Antti Säynätjoki / Optoelektroniikan laboratorio.

More information: Contact Antti Säynätjoki



AFM

Nanoscope IIE AFM

Morfology of hard surfaces.

  • max. sample size ca. 5 mm x 5 mm
  • max. scanning area 13 µm
  • res. 3 Å vertical
  • diameter of probe tip ca. 10-100 nm

Contact person Antti Säynätjoki / Optoelektroniikan laboratorio.

More information: atomi.hut.fi/facilities.php




SECM

CH Instruments SECM

  • Scanning electrochemical microscope.

Contact person Lasse Murtomäki / Fysikaalisen kemian ja sähkökemian laboratorio

More information: Link to equipment list




AM

Hitachi mi-scope hyper Acoustic microscope

  • High-resolution linear motor scanner.
  • Ultrasonic system: 1-230 MHz.
  • Scan area: X = 300 mm, Y = 300 mm, Z = 50 mm.

Contact person doc. Kari Lounatmaa / Elektroniikan valmistustekniikan laboratorio.

More information: www.ept.hut.fi/Facilities



Last update 1.12.2008 | Content by UMK

Takomo